(1-Hydroxyethylidene)bis-phosphonic acid tetrasodium salt HEDP 4Na CAS 3794-83-0

CAS:3794-83-0

Chitarisiko:Upfu huchena/Mvura Isina Ruvara

Fomura reMamorekuru:C2H4Na4O7P2

Kurema kwemamorekuru:293.96

Mamwe Mazita:HEDP Na4, (1-Hydroxyethylidene)bis-phosphonic acid tetrasodium munyu

Siya Mharidzo Yako

Ruzivo rweChigadzirwa

Dhawunirodha

Matagi eChigadzirwa

Chii chinonzi HEDP 4Na CAS 3794-83-0?

Chigadzirwa ichi chine viscous liquid ine ruvara rwebrown-yellow. Huremu hwechigadzirwa ichi (pa20℃) i1.40. Chimiro chayo chakachena chine poindi yekunyunguduka ye198-199℃ uye chinonyunguduka mumvura neethanol. Chigadzirwa chakasimba chine hygroscopicity yakasimba.

Tsanangudzo

Chinhu	Tsanangudzo
Chitarisiko	Upfu chena
Zviri Mukati (seHEDP)%	56.0MIN
Zviri Mukati (seHEDP 4na)%	80MIN
Huwandu hwe phosphoric acid (sePO43-)%	52MIN
PH (1% mvura mhinduro)	11~12
Iron ppm	20MAX
Kuderedza uremu kwakaoma (hunyoro)%	15MAX

Chinhu	Magadzirirwo
Chitarisiko	Mvura inoonekera isina ruvara kana yero yakachenuruka
Zviri Mukati (seHEDP)%	20.3-21.7
Zviri Mukati	29.0-31.0
pH	10.0- 12.0
Simbi, ppm	20 max
Kuwanda kwemunhu @20℃ , g/cm3	1.26- 1.36

Kushandiswa

Inogona kusanganiswa nemaion esimbi akasiyana-siyana.

Inoshandiswa senzira yekudzivirira masero mumvura inotonhodza uye mukurapa mvura yemuboiler. Inodzivirira kupisa zvakanaka. Ichiri kushanda zvakanaka pa200℃.
Inogona zvakare kushandiswa se corrosion inhibitor, cyanide-free plating additives.